Alumina; Emery; Corundum; 1302-74-5; oxo(oxoalumanyloxy)alumane; Corundum (Al2O3); Sapphire (Al2O3); 12415-34-8; Aluminum oxide, alpha-phase; Electrocorundum; Aluminum oxide, alpha; Aluminum oxide, gamma; Korund; alpha-Corundum; Aluminum oxide, gamma-alpha; Abramant F 36; Abramax F 46; Abramax F 54; Aluminum oxide, catalyst support; MP 1 (Refractory); Dural F 30; MFCD00003424; Aluminum oxide, fused, insulating powder; KO 7; Aluminum oxide, neutral, HPLC Flash Grade; EKF 100; KER 710; KU 10; NK 63; FN 237; KU 5-3; Aluminum oxide, Drysphere desiccant, without indicator; Aluminumoxide; Aluminum oxide, CP; Anti-bumping granules; Aluminum oxide, cement; Aluminum oxide, puriss.; gamma-Alumina, low soda; Aluminum oxide 90 acidic; Aluminum oxide, Type A-5; Aluminum oxide, Puratronic?; Aluminum oxide, 1-5 micron; Aluminum oxide, Type CG-20; Aluminum oxide, pellets, 3 mm; Aluminum oxide 90 active basic; CHEMBL4594252; gamma-Alumina, 1/16' spheres; Aluminum Oxide Powder, 99.5%; Aluminum oxide desiccant, regular; TWNQGVIAIRXVLR-UHFFFAOYSA-N; Aluminum oxide, for chromatography; Aluminum oxide, powder, ultra dry; Aluminum oxide, Type WA-4: Acid; Aluminum oxide, Type WA-7: Acid; Aluminum oxide, Type WB-5: Basic; MFCD00211795; MFCD07370730; Aluminum oxide, Type WN-9: Neutral; AKOS015903822; Aluminum oxide, -100, +325 mesh; Aluminum oxide, 5 mum mean particle size; Aluminum oxide, basic, HPLC Flash Grade; BP-31011; Aluminum oxide, acidic, HPLC Flash Grade; Aluminum oxide, Grade H-152, 1/8 in.; Aluminum oxide, calcined, insulating powder; Aluminum oxide, catalyst support, low silica; Aluminum oxide (alpha) powder, 99.97% Nano; Aluminum oxide Corundum, a-phase, -100 mesh; Aluminum Oxide Powder (alpha), 99.9% Nano; Aluminum oxide, 99.997% trace metals basis; Aluminum oxide (gamma) Powder, 99.97% Nano; Aluminum oxide, polishing compound, 2oz (57g); Aluminum oxide, puriss., >=98% Al2O3 basis; Aluminum oxide, SAJ special grade, >=98.0%; Aluminum oxide, pore size 58 ??, ~150 mesh; Alumina, NIST(R) SRM(R) 699, reduction grade; Alumina, NIST(R) SRM(R) 742, reference point; Aluminum oxide, 20% in H2O, colloidal dispersion; Aluminum oxide, Aerosol Refractory Brushable Paint; Aluminum oxide, catalyst support, low surface area; Aluminum oxide, Corundum, alpha-phase, -100 mesh; Aluminum oxide, powder, 99.99% trace metals basis; Aluminum oxide, Drysphere desiccant, with 20% indicator; Aluminum oxide, nanopowder, <50 nm particle size (TEM); Aluminum oxide, basic, for TLC, 5-15 Micron APS Powder; Aluminum oxide, nanofiber, diam. x L <20 nm x 100 mum; Aluminum oxide, nanofiber, diam. x L <20 nm x 500 mum; Aluminum oxide, 99.3%, < 325 mesh, d 50 5 - 7 micron; Aluminum oxide, nanowires, diam. x L 2-6 nm x 200-400 nm; Aluminum oxide, single crystal substrate, <0001>; Aluminum oxide, Type WN-6, Neutral, Activity Grade Super I; Aluminum oxide substrate, 10x10x0.5mm, polished one side, A plane; Aluminum oxide substrate, 10x10x1mm, polished one side, C plane; Aluminum oxide, alpha, catalyst support, low surface area, trimodal; Aluminum oxide, fused, powder, primarily alpha-phase, -325 mesh; Aluminum oxide, fused, powder, primarily alpha-phase, 100-200 mesh; Aluminum oxide, gamma, catalyst support, high surface area, bimodal; Inhibitor removers, Prepacked column, for removing tert-butylcatechol; Aluminum oxide, calcined, powder, primarily alpha-phase, 100-325 mesh; Aluminum oxide, catalyst support, intermediate surface area (low SiO2); Aluminum oxide, mesoporous, MSU-X (wormhole), average pore size 3.8 nm; Aluminum oxide, primarily alpha-phase, fused, 200-325 mesh, >=99%; Inhibitor removers, replacement packing, for removing tert-butylcatechol; Aluminum oxide, nanopowder, 13 nm primary particle size (TEM), 99.8% trace metals basis; Sapphire substrate, 10x10x0.432mm, EPI polished two sides, C-axis, LED grade; 12174-49-1; Aluminum oxide 90 active neutral, (activity stage I) for column chromatography 0.063-0.200 mm (70 - 230 mesh ASTM); Aluminum oxide, powder, primarily alpha phase, <=10 mum avg. part. size, 99.5% trace metals basis; Inhibitor removers, Prepacked column for removing hydroquinone and monomethyl ether hydroquinone; Inhibitor removers, replacement packing for removing hydroquinone and monomethyl ether hydroquinone; Sapphire substrate, 50.8mm dia x 0.332mm thick, EPI polished one side, C-axis, HEMCOR single crystal; Sapphire substrate, 50.8mm dia x 0.332mm thick, EPI polished two sides, C-axis, HEMCOR single crystal; Sapphire substrate, 50.8mm dia x 0.432mm thick, EPI polished one side, C-axis, HEMCOR single crystal